IHI sintering furnace and firing furnace have a record of 30 years delivering sintering treatment for various kinds of materials including iron, stainless steel, cermet, cemented carbide and various kinds of ceramics. We stock and provide highly productive support for vertical, horizontal, high temperature (up to 2,550°C), high pressure (up to 10 MPa) and continual (tunnel shape, multi chamber) forms. We support the various needs of our customers such as the development of products using new materials.
The carbon material treatment furnace provides a complete menu including carbonizing furnace for carbon fiber and graphitizing using coal and petroleum pitch materials, pitch impregnation furnace for carbon fiber composite material, high temperature graphitization furnace and high level purification furnace for carbon material used by semiconductor manufacturing equipment. Since the high temperature graphitization furnace can reach a temperature of up to 3,000°C, a range of materials can be burned and thermally processed including negative-electrode materials for LiB.
Also continuous non-solubility furnaces and carbonization furnaces as a carbon fiber production equipment are also supported.
Depending on the installation location and product being processed, option for base insertion / upper insertion / side insertion method is possible.
Exhibits superior temperature uniformity within the vacuum to pressure (0.9 MPa) range
Cooling time is reduced by using pressure and gas fan cooling.
Using an inner muffle, refractory lining is protected from degreasing and sintering out-gas.
Adoption of high performance wax trap
Application
Various metals, delipidation of ceramic materials and sintering process (suitable for long objects that do not like to change shape due to sagging during sintering)
Horizontal sintering furnace
Feature
Side door model that excels in usability and maintenance
Exhibits superior temperature uniformity within the vacuum-pressure (0.9 MPa) range.
Cooling time is reduced by using pressure and gas fan cooling.
Using an inner muffle, refractory lining is protected from degreasing and sintering out-gas.
Adoption of high performance wax trap
Application
Various metals, delipidization of ceramic materials, sintering process
High pressure sintering furnace (vertical type, horizontal type)
Feature
Can be used vertically or horizontally according to purpose.
Exhibits superior temperature uniformity within the vacuum-pressure (9.8 MPa) range. (Temperature measurement for 9 marks is within 6°C when at 1,200°C, 9.8 MPa)
Consecutive processing of high-pressure sintering, delipidation and vacuum sintering is possible in one furnace
Using water cooling fin door (IHI patent) cooling time is reduced.
Using an inner muffle, refractory lining is protected from degreasing and sintering out-gas.
Adoption of high performance wax trap
Application
Various metals, delipidization of ceramic materials, sintering process
Specification / Load
Multichamber and continuous sintering furnace
Feature
Several to several tens times productivity compared to batch type furnace
Maintains greater stability and high quality using superior temperature uniformity.
Chamber structure can be adapted according to process.
Application
Various metals, delipidization of ceramic materials, sintering process
For semi-conductor production, LCD panel production, hard disk production
Carbon products for machinery, products for sliding portion, carbon fiber, composite material
High level refinement furnace
Feature
Using a muffle, the halogen gas which is a process gas does not leak easily and with the quantity consumed for the small amount of halogen gas, improved refinement efficiency is possible.
Furnace body configuration and framework which are corrosive resistant to halogen gas
Using internal and external simultaneous pressure regulation, effect of inactive gas outside muffle is reduced and improved refinement efficiency possible.
By adopting a gas condenser tube and bug filter strap in the vacuum pumping system, the reaction product can be collected efficiently.
Application
High purity treatment for carbon material used in the semi-conductor manufacturing equipment
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